XRD and SEM studies of reactively deposited tin oxide thin films
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چکیده
منابع مشابه
Physical Properties of Reactively Sputter-Deposited C-N Thin Films
This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...
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ژورنال
عنوان ژورنال: Bulletin of Materials Science
سال: 1995
ISSN: 0250-4707,0973-7669
DOI: 10.1007/bf02744841